CHINA HAIHENG INTL TRADE GROUP CO.,LIMITED
Facebook:China Haiheng International Group
whatsapp:+86 13663804870
E-MAIL:chhgc@chhgc.com
Website:www.chhgc.com
ADD:Hongkong,China
Purpose: Step by step lithography can reduce the scale of mask pattern and transfer it to the substrate surface to be exposed.
Main specifications: the mask pattern can be reduced by 5 times in the same proportion for exposure; Linewidth: up to 500nm; A variety of models of positive and negative photoresist can be used together;
Applicable chip size: the sample size cannot be greater than 6 inches.
Splashable materials: metal like Al, Cu, Gr, Co, Fe, Ni, Pt, Ag, Ti, Ta; Alloy NiFe, CoFe, CoFeB, NiMn, FeMn, TbFeCo; Oxide MgO, etc.
Size: 170 cm * 130 cm * 180 cm
Product features:
High accuracy;
Desktop type, small size, built-in computer;
Customizable hardware and software to meet the needs of the industry;
Elasticity is applicable to various substrates and shapes;
Application field:
Small and medium scale integrated circuit;
Semiconductor components;
Development and production of SAW devices;
Detailed parameters:
Chip size | 4 ", 6", 8 ", 12" |
Exposure light source | UV-LED |
Light source wavelength used | 365nm |
Resolving power | Develop 500nm, 400nm and 300nm successively |
Focus accuracy | 150nm |
Scale Multiplier | 1:0.5 |
Exposure mode | Step projection type |
Feature size uniformity(CDU) | ±10% |