CHINA HAIHENG INTL TRADE GROUP CO.,LIMITED
Facebook:China Haiheng International Group
whatsapp:+86 13663804870
E-MAIL:chhgc@chhgc.com
Website:www.chhgc.com
ADD:Hongkong,China
Purpose: Contact exposure means that the mask plate directly contacts with the photoresist layer of the substrate. The exposed graphics and the graphics on the mask plate have high resolution accuracy and simple equipment;
1. Semiconductor manufacturing;
2. Optoelectronics and flat plates;
3. RF microwave, diffractive optics;
4. MEMS;
5. Concave convex or crystal clad equipment, etc.
Main specifications: line width can reach 800nm; A variety of models of positive and negative photoresist can be used together;
Applicable chip size: the sample size cannot be greater than 6 inches.
Product features:
1. The resolution is accurate;
2. Wider range of UV wavelength selection;
3. Support constant light intensity or constant power mode;
4. It is widely used in the fields of semiconductor, microelectronics, biological devices and nanotechnology.
Instrument detailed parameters:
Chip size | 4 ", 6", 8 " |
Exposure light source | 365nm、380nm、395nm |
Resolving power | 3μm |
Alignment accuracy | 300nm |
Scale Multiplier | 1:0.5 |
Exposure mode | Contact exposure |
Feature size uniformity | ±10% |
Size | 170 cm*130 cm*180 cm |